发明名称 METHOD FOR MEASURING AND CONTROLLING CONCENTRATION OF ELEMENT IN SEMICONDUCTOR
摘要 PURPOSE:To measure the concn. profile of the element in a semiconductor within a short time and to control the growth of a membrane in situ. CONSTITUTION:The optical data of a semiconductor is measured by ellipsometry and converted to an element concn. profile on reference to the data base of preliminarily accumulated optical data/composition data. By this constitution, the concn. profile of impurity is calculated and the composition file of a two- component type semiconductor during the growth of a membrane is hourly calculated to be fed back to a growing condition.
申请公布号 JPH0540087(A) 申请公布日期 1993.02.19
申请号 JP19910199457 申请日期 1991.08.08
申请人 FUJITSU LTD 发明人 FUJIOKA HIROSHI
分类号 G01N21/21;G01N21/35;H01L21/00;H01L21/66 主分类号 G01N21/21
代理机构 代理人
主权项
地址