发明名称 PHOTOSETTING RESIN COMPOSITION, FORMATION OF PROTECTIVE LAYER AND COLOR FILTER
摘要 <p>PURPOSE:To provide a photosetting resin compsn. having high sensitivity to exposure with UV, developable with an aq. alkali soln. and most suitable for use as the material of a protective layer for a color filter layer having excellent chemical and heat resistances and adhesion to the substrate, to form a protective layer with the photosetting resin compsn. and to provide a color filter with the protective layer. CONSTITUTION:This photosetting resin compsn. contains a polymer having carboxyl groups in the molecule, a compd. having at least two ethylenic unsatd. double bonds in the molecule, a photopolymn. initiator and a compd. having at least one epoxy group in the molecule. The polymer having carboxyl groups in the molecule is a copolymer contg. repeating units derived from at least one kind of compd. selected among acrylic acid, methacrylic acid, benzyl acrylate and benzyl methacrylate or these compds. and alkyl methacrylate having a 1-12C alkyl group.</p>
申请公布号 JPH0534920(A) 申请公布日期 1993.02.12
申请号 JP19910190002 申请日期 1991.07.30
申请人 FUJI PHOTO FILM CO LTD 发明人 IWASAKI MASAYUKI
分类号 G02B5/20;C08L33/06;G03F7/027;G03F7/032;G03F7/033;G03F7/038;G03F7/11 主分类号 G02B5/20
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