| 摘要 |
PURPOSE:To obtain the composition in which exposure reaches the lower part of a resist film and which is sufficiently cured and to obtain an excellent pattern profile by forming the alkalisoluble resin with a polymer having a specified structural unit. CONSTITUTION:This composition contains an alkali-soluble resin, a acid photozeurator and a cross-linking agent for the alkali-soluble resin acting in acidic condition. The alkali-soluble resin consists of a polymer having a vinylphenol structural unit shown by formula II, and the polymer is synthesized by the decomposition reaction of an alkoxycarbonyl group of a polymer having a structural unit shown by formula I. In formulas I and II, R<1> is hydrogen atom or an alkyl, and R<2> is an alkyl. Besides, hydrogen atom is preferably used as R<1> and t-butyl as R<2>. |
