发明名称 Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
摘要 A positive photosensitive planographic printing plate is disclosed which has a photosensitive layer comprising in combination a specific o-naphthoquinonediazidosulfonic ester and a resin having a specific structural unit(s). Said photosensitive layer may also contain a novolak resin and/or an organic acid.
申请公布号 US5182183(A) 申请公布日期 1993.01.26
申请号 US19910789550 申请日期 1991.11.08
申请人 MITSUBISHI KASEI CORPORATION;KONICA CORPORATION 发明人 TOMIYASU, HIROSHI;KOBAYASHI, YOSHIKO;GOTO, KIYOSHI;YAMAMOTO, TAKESHI;NAKAI, HIDEYUKI
分类号 G03F7/023 主分类号 G03F7/023
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