THIN-FILM COATINGS MADE BY MEANS OF PLASMA-ACTIVATED CHEMICAL VAPOR DEPOSITION OF FLUORINATED CYCLE SILOXANES

摘要

The present invention refers to the deposition of thin film coatings produced by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes of the structure ¢RR'Sio!, in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 1-6 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4.