发明名称 MASK FOR EXPOSING
摘要 <p>PURPOSE:To obtain the mask for exposing which is less changed by temp. and humidity, allows exposing with high accuracy and can be inexpensively produced. CONSTITUTION:This mask 1 for exposing is used to form resist patterns for etching, etc., at the time of producing printed circuit boards and is constituted by laminating a film base material 2 formed with an emulsion layer 3 on a glass base material 5, fixing the base materials by an adhesive layer 6 and forming patterns 4 for exposing on the emulsion layer 3.</p>
申请公布号 JPH0511432(A) 申请公布日期 1993.01.22
申请号 JP19910161405 申请日期 1991.07.02
申请人 MITSUBISHI ELECTRIC CORP 发明人 SUGANUMA SHUICHI;OTA MAKOTO
分类号 G03F1/00;G03F1/68;H01L21/027;H05K3/00 主分类号 G03F1/00
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