FORMATION METHOD OF INTERCONNECTION FILM FOR INTEGRATED CIRCUIT DEVICE USE,申请号JP19910154981-传众专利搜索

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发明名称	FORMATION METHOD OF INTERCONNECTION FILM FOR INTEGRATED CIRCUIT DEVICE USE
摘要
申请公布号	JPH056867(A)	申请公布日期	1993.01.14
申请号	JP19910154981	申请日期	1991.06.27
申请人	FUJI ELECTRIC CO LTD	发明人	NISHIZAWA MASATO
分类号	H01L21/28;H01L21/768;H01L23/522	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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