| 摘要 |
PURPOSE:To improve alignment accuracy by eliminating alignment error even if SiON remains on alignment marks. CONSTITUTION:An SiON film is formed on a substrate by CVD using a reaction gas composed of silane-containing gas, oxygen-containing gas, and nitrogen- containing gas. The composition of the reaction gas is adjusted so that the reflectivity of the SiON film may substantially be equal to that of a resist film to be formed thereon. Preferably, the silane-containing gas is SiH4, the oxygen-containing gas is O2, and the nitrogen-containing gas is N2. |
