| 摘要 |
PURPOSE:To obtain a positive resist composition excellent in resolution while maintaining the characteristics such as heat resistance, sensitivity, remainder film rate, coating property and profile by using a specified org. solvent. CONSTITUTION:A compd. shown by CH3COOC(R)(R')COOR'' (where R and R' are independently H or a 1-5C alkyl group, and R'' is a 1-5C alkyl group which can be substituted) is used as the solvent for a positive resist composition consisting essentially of quinone diazide and an alkali-soluble resin. Methyl lactate acetate is exemplified as the compd. Although other solvents are jointly used for the composition, the amt. of the compd. to be used is preferably controlled to 50-100wt.%. |
