发明名称 WINDOW FOR MICROWAVE PLASMA PROCESSING DEVICE
摘要 <p>A microwave transmitting window (100) for a plasma processing device characterized by a low microwave reflection factor and capable of generating homogeneous plasma in a stable and effective manner. The window is a body of one or more pieces of the same or different dielectric materials. A surface (100a) of the window facing a microwave transmitting horn (107) or waveguide (106) is planar and extends perpendicularly to an axial direction. An opposite surface (100b) of the window is recessed such that the body has a non-uniform thickness between the two surfaces. The recessed surface can have various shapes, and the overall size of the window can be equal to the size of a plasma formation chamber (104) of the plasma processing device. The outlet of the plasma formation chamber can be formed in an end wall, or the outlet can be formed by the inner periphery of the plasma formation chamber.</p>
申请公布号 WO1992022085(A1) 申请公布日期 1992.12.10
申请号 US1992004338 申请日期 1992.05.22
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