发明名称 PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION AND METHOD OF PATTERN FORMING
摘要 PURPOSE:To provide a photosensitive thermosetting resin compsn. suitable for the production of printed circuit boards and the like and to offer the formation method of patterns. CONSTITUTION:The photosensitive thermosetting resin compsn. contains the following components (a)-(d) as essential components. (a) Photosensitive oligomers obtd. by effecting the reaction of alpha,beta-unsatd. monocarboxylic acid ester having alcohol type hydroxyl groups expressed by formula I with polymers and/or copolymers obtd. by adding alpha,beta-unsatd. dicarboxylic acid anhydride to polymers and/or copolymers of conjugated dienes having 500-5000 number average mol.wt. so that at least >=80mol% of the acid anhydride group of the additional compd. is subjected to open-ring reaction. (b) photopolymn. initiator, (c) epoxy resin having two or more epoxy groups in the molecule, and (d) 2,4- diamino-6-vinyl-S-triazine. In formula I, R<1> and R<2> are hydrogen atom or org. residues of 1-6 carbon number, R<3> is an alkylene group of 2-12 carbon number.
申请公布号 JPH04356051(A) 申请公布日期 1992.12.09
申请号 JP19910035617 申请日期 1991.02.04
申请人 NIPPON OIL CO LTD;ASAHI CHEM RES LAB LTD 发明人 KAMOSHITA HIDEAKI;OBA YOICHI;IWASA SANDAI;YUASA HITOSHI;SATO HARUYOSHI;OTSUKI YUTAKA
分类号 C08F299/00;C08F290/00;C08G59/00;C08K5/3477;C08K5/3492;C08L63/00;G03F7/027;G03F7/028;G03F7/029;G03F7/032;G03F7/038;H01L21/027;H01L21/30;H05K3/06;H05K3/28 主分类号 C08F299/00
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