发明名称 METHOD AND APPARATUS FOR EVALUATING AMOUNT OF IMPURITY ADSORPTION
摘要 PURPOSE:To evaluate the adsorption of sample gas at a super-high purity level for various kinds of materials. CONSTITUTION:Inactive gas of super-high purity is supplied into a sample pipe through a purifying device 1 (first gas supplying source). Then, the inside of the sample pipe 16 is baked with heaters 19-21 (heating means). Then, the inside of the sample pipe 16 is made to be atmosphere at a specified temperature. Thereafter, the opening and closing states of selector valves 9 and 20 are changed, and sample gas in specified concentration is made to flow into the sample pipe from a cylinder 6 (second gas supplying source). The gas is made to flow in until the adsorption of impurities is saturated, i.e., from the time when the sample gas is made to flow to the time when a microanalyzer 25 detects the sample gas having the specified concentration.
申请公布号 JPH04353743(A) 申请公布日期 1992.12.08
申请号 JP19910155879 申请日期 1991.05.30
申请人 OMI TADAHIRO 发明人 OMI TADAHIRO
分类号 G01N13/00;G01J5/00;G01N15/06;G01N15/08;G01N27/62 主分类号 G01N13/00
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