| 摘要 |
PURPOSE:To obtain an inexpensive and simple filter by constituting a pseudo two-dimensional filter by providing an X-direction filter and a Y-direction filter in the inspection of the pattern of a mask, etc., to be used in the manufacturing process of a semiconductor. CONSTITUTION:A CCD camera 1 picks up the image of the pattern of the mask, etc., of an object 7 to be inspected. The data of the camera 1 is digitized by an A/D converter 2. 7 bits in the data of 8 bits of every picture element of a CCD element are luminance data. Each bit of this luminance data is multiplied by coefficients by the coefficient multipliers 31 to 37 of the X-direction filter 3, and is summed by an addition circuit 38 so that enhancement in the direction X is executed. Further, output data from the X-direction filter 3 is inputted to the coefficient multiplier 51 of the Y-direction filter, and simultaneously, it is inputted to the coefficient multipliers 52 to 57 through delay circuits 41 to 46 successively. Then, it is multiplied by the coefficients b1 to b7 by the coefficient multipliers 51 to 57 so that the enhancement in the direction Y is executed by adding it by the adding circuit 58. |
