发明名称 |
METHOD AND DEVICE FOR FORMING HYDROGENATED AMORPHOUS CARBON FILM ON BASE MATERIAL |
摘要 |
PURPOSE:To provide the method and device for forming a hydrogenated amorphous carbon film on a substrate by increasing an optical band gap without lowering the physical hardness of the film and without lowering a film forming speed. CONSTITUTION:This method consists in cooling the substrate and using gas having a Penning effect as the diluting gas for gaseous methane and this device is constituted by installing a substrate cooler and a diluting gas introducing device to the chemical vapor deposition device using a high-frequency plasma discharge. |
申请公布号 |
JPH04346667(A) |
申请公布日期 |
1992.12.02 |
申请号 |
JP19910147918 |
申请日期 |
1991.05.23 |
申请人 |
RICOH CO LTD |
发明人 |
TANABE MAKOTO;TAKAHASHI MASAYOSHI;OTA HIDEKAZU;KIMURA YUJI;KONDO HITOSHI;YAMADA KATSUYUKI;KAMEYAMA KENJI |
分类号 |
C01B31/00;C01B31/02;C23C16/26;C23C16/50 |
主分类号 |
C01B31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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