发明名称 METHOD AND DEVICE FOR FORMING HYDROGENATED AMORPHOUS CARBON FILM ON BASE MATERIAL
摘要 PURPOSE:To provide the method and device for forming a hydrogenated amorphous carbon film on a substrate by increasing an optical band gap without lowering the physical hardness of the film and without lowering a film forming speed. CONSTITUTION:This method consists in cooling the substrate and using gas having a Penning effect as the diluting gas for gaseous methane and this device is constituted by installing a substrate cooler and a diluting gas introducing device to the chemical vapor deposition device using a high-frequency plasma discharge.
申请公布号 JPH04346667(A) 申请公布日期 1992.12.02
申请号 JP19910147918 申请日期 1991.05.23
申请人 RICOH CO LTD 发明人 TANABE MAKOTO;TAKAHASHI MASAYOSHI;OTA HIDEKAZU;KIMURA YUJI;KONDO HITOSHI;YAMADA KATSUYUKI;KAMEYAMA KENJI
分类号 C01B31/00;C01B31/02;C23C16/26;C23C16/50 主分类号 C01B31/00
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