| 摘要 |
PURPOSE:To provide an inorganic film which is useful as an X-ray transmission film for X-ray lithography mask since it has a superb surface smoothness, a high visible light transmission, and a high resistance to SOR since to distortion is generated even if a high-energy beam is applied. CONSTITUTION:An X-ray transmission film for X-ray lithography mask consists of an inorganic thin film as a main material which is shown by an expression SiCxNy consisting of three elements of silicon, carbon, and nitrogen which are obtained from one or more types of compounds where silicon, carbon, or nitrogen is contained by the chemical vapor deposition method. |
