| 摘要 |
PURPOSE:To obtain sensitivity to radiation and to enable use as a resist material by incorporating a compound to generate a base by irradiation with specified radiation and a compound to be hardened or decomposed in basic conditions. CONSTITUTION:The compound to be added is hardened or decomposed in basic conditions, and the other compound to be added is allowed to generate the base by irradiation of radiation and represented by formula I in which each of R1-R3 is, independently, H, halogen, <=5C alkyl, such as methyl, ethyl, or propyl, alkenyl, such as vinyl, propylenyl, alkynyl, such as acetynyl, phenyl, or alkoxy, such as methoxy, ethoxy, or propoxy. |
