TARGET FOR SPUTTERING AND ITS PRODUCTION,申请号JP19910115463-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	TARGET FOR SPUTTERING AND ITS PRODUCTION
摘要
申请公布号	JPH04323366(A)	申请公布日期	1992.11.12
申请号	JP19910115463	申请日期	1991.04.19
申请人	ASAHI GLASS CO LTD	发明人	MITSUI AKIRA
分类号	C23C14/34;H01L21/285	主分类号	C23C14/34
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Hot corrosion resistant single crystal nickel-based superalloys

An ecological thermoelectric cooling system

Wrap-around carrier

Synthesis of a perfluoroalkyl bromide by photobromination of the corresponding iodide

Transdermal system for administering pharmaceutical compounds under ph control

Aqueous solutions especially for cleaning high strength steel

Materials for the production of nanometer structures and use thereof

Panty-type sanitary napkin

Computer interfaced image scanner

COMPOSITIONS FONGICIDES A BASE DE DERIVES 3-PHENYL-PYRAZOLES POUR LE TRAITEMENT DU MATERIEL VEGETAL DE MULTIPLICATION, NOUVEAUX DERIVES 3-PHENYL-PYRAZOLES ET LEURS APPLICATIONS FONGICIDES

OPTICAL GLUCOSE SENSOR

Expanding medullary osteosynthesis rod

Toll booth security wall allowing communication between users

UTILISATION DU TRAMAGE A MODULATION DE FREQUENCE POUR ALLEGER EN OFFSET LES SURFACES IMPRIMANTES

CASSETTE D'EXPRESSION D'UNE PROTEINE P30 DE TOXOPLASMA GONDII

Electric cable connection procedure for linking cores end to end

Device for manufacturing vertical or diagonal concrete components on site

ESCALIER A CONFIGURATION VARIABLE

FER A REPASSER A VAPEUR