POST DRY-ETCH CLEANING METHOD FOR RESTORING WAFER PROPERTIES,申请号EP19870107478-传众专利搜索

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发明名称	POST DRY-ETCH CLEANING METHOD FOR RESTORING WAFER PROPERTIES
摘要
申请公布号	EP0252262(B1)	申请公布日期	1992.11.11
申请号	EP19870107478	申请日期	1987.05.22
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	CHAKRAVARTI, SATYA NARAYAN;FONASH, STEPHEN JOSEPH;MU, XIAO-CHUN
分类号	H01L21/302;H01L21/3065;H01L21/311;H01L21/322	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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