| 摘要 |
PURPOSE:To provide the reflection type liquid crystal display device provided with a reflection plate having good reproducibility and reflection characteristics. CONSTITUTION:A thin film 18 having ruggedness 14 is formed by using an electron beam vapor deposition method, chemical vapor reaction method, plasma CVD method, etc., on one surface of a substrate 11. A reflection film 16 consisting of a metallic thin film is formed on this thin film 18 and further, an oriented film 27 is formed thereon to obtain the reflection plate 17. An active matrix substrate 20 is disposed to face the reflection plate 27. Picture element electrodes 23, thin-film transistors 22 and the oriented film 24 are formed on the active matrix substrate 20. A liquid crystal layer 25 of a phase transition type guest-host mode is sealed between the active matrix substrate 20 and the reflection plate 17. The reflection characteristics of the reflection plate are controlled by properly selecting the conditions for forming the thin film in this way. |
