发明名称 MICRO CRYSTAL SILICON THIN-FILM SEMICONDUCTOR DEVICE AND LIQUID DISPLAY DEVICE USING THE SAME
摘要 <p>PURPOSE:To obtain a liquid crystal surface device which enables a high-speed switching to be made by forming a micro crystal silicon layer (muC-Si) on a plastic substrate. CONSTITUTION:A gate electrode 2 is formed on a plastic film substrate 1, a gate insulation film 3 is formed, and then an undoped muC-Si 4 is formed. Then, n(+)-muC-Si 5 for ohmic contact is formed continuously and is machined to a specific shape. thus enabling a muC-Si layer 6 to be formed. Therefore, a film of a TFT(thin film transistor) can be formed at a low temperature, the obtained muC-Si film has no photocon property, it shows a high conductivity and a high mobility and is suited for a high-speed drive, and further a threshold value can be controlled by activation according to ion-implantation + excimer laser at the time of its manufacture. Also, a liquid crystal display device with the TFT achieves a high-speed switching.</p>
申请公布号 JPH04313273(A) 申请公布日期 1992.11.05
申请号 JP19910104815 申请日期 1991.04.10
申请人 RICOH CO LTD 发明人 MORI KOJI
分类号 G02F1/136;G02F1/1368;H01L29/78;H01L29/786 主分类号 G02F1/136
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