发明名称 Sidewall-sealed poly-buffered LOCOS isolation
摘要 This is a semiconductor device, comprising: a semiconductor body having an isolation region separating at least two active device regions; pad oxide layers disposed on said active regions; polysilicon layers disposed on said pad oxide layers; silicon nitride layers disposed on said polysilicon layers; and a sidewall seal disposed all along the perimeter of the active device regions to seal said active device regions against oxygen diffusion. The resulting field oxide isolation region has reduced oxide encroachment into the active moat region.
申请公布号 US5159428(A) 申请公布日期 1992.10.27
申请号 US19900622698 申请日期 1990.12.05
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 RAO, KALIPATNAM V.;TOMLIN, JOEL T.;BEALS, MONICA A.
分类号 H01L21/32 主分类号 H01L21/32
代理机构 代理人
主权项
地址