| 摘要 |
PURPOSE:To obtain the photosensitive resin compsn. which forms a positive type resist having a high resolution, high sensitivity and high heat resistance. CONSTITUTION:This photosensitive resin compsn. contains the alkali-soluble novelak resin which is resin formed by subjecting at least one kind (A) of the phenols expressed by formula (I) and at least one kind (B) of the phenols having 3 pieces of the phenolic hydroxyl groups expressed by formula (II) to polycondensation by using a aldehydes and specifying the ratio of the charging molar number of (A) and (B) to a 0.01<=(B)/(A)+(B)<=0.3 range and a quinonediazide compd. (In the formula I, R1 denotes hydrogen, 1 to 5C alkyl group, aralkyl group or alkoxy group; n1 denotes integer 1 to 4.) (In the formula II, R2 denotes hydrogen, 1 to 5C alkyl group, aralkyl group or alkoxy group; n2 denotes integer 1 to 3). |
