| 摘要 |
A positive photosensitive film forming compsn. contains (a) from 2-35 dry wt.% of a substd. deriv. of 5-diazo barbuturic acid which shows deep UV absorption and is of formula (I) or (II) (b) 65-98 dry wt.% aq. alkaline soluble resin; and (c) a solvent. R1-2 = 3-12C alkyl, cyclohexyl, benzyl or 2-6C aralkyl; R3-4 = 1-12C alkyl, cyclohexyl, benzyl or 2-6C aralkyl; and R5 = alpha, omega-di substd. 2-12C alkyl, methylene dicyclohexyl or 1-6C aralkyl-phenylene. Also claimed is a substrate carrying a resist contg. components (a) and (b).
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