| 摘要 |
PURPOSE: To provide a strip compsn. which consists of a hydroxyl amine, an alkanol amine or a polar element and removes corrosion resistant films, photosensitive corrosion resistant films, cured polymer corrosion resistant films and org. metallic polymers from bases without damaging the bases and without disturbing the work during the production of semiconductor integrated circuits or during a plasma etching stage. CONSTITUTION: This compsn. is the strip compsn. which contain the hydroxyl amine and at least one of the alkanol amines and removes the corrosion resistant films from the bases. One or more polar solvents may be included therein as arbitrary components. The compsn. removes the photosensitive corrosion resistant films in particular from the bases during the production of the semiconductor integrated circuits and removed cured coatings, for example, polyimide coatings, therefrom. |
