发明名称 Procédé d'affinage poussé de métaux appartenant au 3 deg. groupe de la classification périodique
摘要 933,430. Making pure indium and gallium, electrolytically. SIEMENS - SCHUCKERTWERKE A.G. June 1, 1962 [June 13, 1961], No. 21338/62. Class 41. Pure gallium and indium are prepared electrolytically using as electrolyte a compound of general formula [Al 2 R 6 X]M, where R is an alkyl radical, X is halogen, and M is alkali metal, ammonium, or preferably a tetra-alkyl N group. The impure Ga or In metal is used as anode and pure metal, e.g. as foil as cathode. In examples, [Al 2 Et 6 Cl]N(CH 3 ) 4 or the equivalent isobutyl compound is heated at 120‹ C., with indium of 99.95% purity as an anode enclosed in a fine-pored linen bag, and 99.999% indium as cathode. Electrolysis is effected at 2 to 5V and C.D. of 1.3A. sq. dm. for several days. The electrolyte is siphoned off and the metal deposit on the cathode after washing in hot benzene, is re-melted under liquid paraffin.
申请公布号 FR1374976(A) 申请公布日期 1964.10.16
申请号 FR19620899951 申请日期 1962.06.06
申请人 SIEMENS-SCHUCKERTWERKE AKTIENGESELLSCHAFT 发明人
分类号 C25C1/22;C25C3/34 主分类号 C25C1/22
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