发明名称 |
PHOTOSENSITIVE COMPOSITION BASED ON ACRYLATES |
摘要 |
A liquid photosensitive composition comprising (1) 40 to 80 % by weight of a urethane (meth)acrylate having a functionality of 2 to 4 and a molecular weight (Mw) of 500 to 10 000, (2) 5 to 40 % by weight of a hydroxyl group containing aliphatic or cycloaliphatic di(meth)acrylate, (3) 0 to 40 % by weight of a mono(meth)acrylate or of a mono-N-vinyl compoun d having a Mw of not more than 500, (4) 0.1 to 10 % by weight of a photoinitiator, (5) 0 to 30 % by weight of an aliphatic or cycloaliphatic: di(meth)acrylate which differs from (2), of an aliphatic tri(meth)acrylate or of an aromatic di- or tri(meth)acrylate, and (6) 0 to 5 % by weight of customary additives, such that the proportion of components (1) to (6) together is 100 % by weigh t. The composition is a photosensitive composition which can be polymerised by irradiation with actinic light and which is suitable for the production preferably.of three-dimensional objects by the stereolithographic technique. |
申请公布号 |
CA2063982(A1) |
申请公布日期 |
1992.09.28 |
申请号 |
CA19922063982 |
申请日期 |
1992.03.25 |
申请人 |
CIBA-GEIGY AG |
发明人 |
STEINMANN, BETTINA;WIESENDANGER, ROLF;SCHULTHESS, ADRIAN;HUNZIKER, MAX |
分类号 |
C08F2/50;C08F2/48;C08F290/00;C08F299/06;C09D4/00;C09D4/02;G03F7/00;G03F7/027;(IPC1-7):G03F7/027;G03F7/031;G03F5/24 |
主分类号 |
C08F2/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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