发明名称 |
Method of growing silicon monocrystalline rod. |
摘要 |
<p>The present invention is intended to provide a method of growing a silicon monocrystalline rod (3) by an FZ process, wherein the dopant distribution of the silicon monocrystalline rod (3) in the diametrical direction is made microscopically uniform, characterized in that a magnetic field forming means (9) is arranged above and/or below a melting zone (4) of said silicon monocrystalline rod (3) to surround said silicon monocrystalline rod (3) and a magnetic field is applied to the melting zone (4) of the silicon monocrystalline rod (3) through said magnetic forming means (9), and preferably the magnetic field forming means (9) is constituted by supplying a direct electric current through a solenoid coil (9) surrounding said silicon monocrystalline rod (3). <IMAGE></p> |
申请公布号 |
EP0504929(A1) |
申请公布日期 |
1992.09.23 |
申请号 |
EP19920104900 |
申请日期 |
1992.03.20 |
申请人 |
SHIN-ETSU HANDOTAI COMPANY, LIMITED |
发明人 |
YAMAGISHI, HIROTOSHI;KIMURA, MASANORI;ARAI, HIDEO |
分类号 |
C30B13/00;C30B13/26 |
主分类号 |
C30B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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