| 摘要 |
PURPOSE:To easily form fine grooves and deep grooves of >=50mum by forming a metallic film on a partition wall. CONSTITUTION:On one main surface of a 1st substrate 1, beltlike electrodes 3 are formed and a liquid crystal layer 6 is arranged in contact with the electrodes 3. On a 2nd substrate 2, on the other hand, discharging electrodes 5 are formed as beltlike electrodes and stuck on a dielectric film 7 and the space between the 2nd substrate 2 and dielectric film 7, i.e., the spaces in respective grooves 4 are discharge areas where discharge plasma is generated. Then the discharge areas are partitioned by partition walls 8 between the grooves 4 to form independent plasma chambers and the metallic film 9 containing Cr is formed on the top surfaces of the respective partition walls 8 to the same width with the partition walls 8 to serve as a black stripe cutting off excessive light. For the manufacture, the contactness of a photoresist layer formed on a glass substrate across the metallic film is secured and then the glass substrate is etched. |
