| 摘要 |
- i PATENT APPLICATION of WAYNE EDMUND FEELY for PHOTOSENSITIVE COMPOUNDS AND THERMALLEY STABLE AND AQUEOUS DEVELOPABLE NEGATIVE IMAGES DN 85-11 MSA:vjc Selected photosensitive compounds activated by deep ultraviolet radiation or x-rays and capable of being employed at very low concentrations in photosensitive compositions are provided for producing thermally stable and aqueously developable, negative images on surfaces. The selected photosensitive compounds are halogenated organic compounds, including 1,1-bis¢p-chlorophenyl!-2,2,2-trichloroethane, which generate an inorganic halogen said upon exposure to deep UV or other short wavelength radiations. They may be used at concentrations of less than 5 weight percent of the total solids content of the photosensitive composition to produce aqueously developable negative images using deep UV exposure. |
