发明名称 TREATMENT OF FLUORINE-CONTAINING GAS
摘要 <p>PURPOSE:To convert fluorine-contg. gas discharged in an untreated state into harmless gas by treatment when fluorine-contg. gases used or generated in various chemical processes. CONSTITUTION:Fluorine-contg. gas to be treated is decomposed by plasma discharge. In this discharge treatment, at least one of Na, K, Mg, Ca, Sr, Ba, Al, Fe, Ni, Cr, Cu, Zn, Si and C, alloys of such elements or inorg. compds. of the elements is put in the plasma discharge region. The fluorine-contg. gas can be made harmless.</p>
申请公布号 JPH04265113(A) 申请公布日期 1992.09.21
申请号 JP19910025982 申请日期 1991.02.20
申请人 MITSUI TOATSU CHEM INC 发明人 NAKAJIMA SHIGEMASA;OE TAKASHI;MIURA AKIKO;MATSUDA TOSHINORI;ITAYA RYOHEI
分类号 B01D53/32;B01D53/34;B01D53/68 主分类号 B01D53/32
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