METHOD FOR MANUFACTURING HIGH TEMPERATURE OXIDE SUPERCONDUCTOR THIN FILM AND DEVICE THEREFOR

摘要

PURPOSE:To provide a method and a device capable of manufacturing a high temperature oxide superconductor thin film with excellent superconductive characteristics by reducing the damage of the vacuum parts, etc. CONSTITUTION:The method is characterized by irradiating with an oxygen radical the surrounding of a substrate 6 while cooling on or after forming a thin film. The device is characterized by installing a means 9 generating an oxygen radical in a reaction film forming device so that the surrounding of the substrate 6 may be irradiated with the oxygen radical.