发明名称 PHOTOREACTIVE HARMFUL MATERIAL-REMOVING MATERIAL AND METHOD FOR REMOVING HARMFUL MATERIAL BY USING THIS MATERIAL
摘要 PURPOSE:To provide the method for efficiently removing malodorous materials, such as mercaptan, ammonia, amine, and aldehyde, and plant growth accelerating materials, such as ethylene, and the removing material for this method. CONSTITUTION:Preferably 1 to 100wt.% photoreactive semiconductors, such as titanium dioxide, zinc oxide and cerium oxide, are deposited on granular pulp having ruggedness on the surface and having preferably 1 to 30mm sizes to obtain the photoreactive harmful material-removing material. The harmful materials, such as mercaptan, amine, aldehyde, and ethylene, are brought into contact with such photoreactive harmful material-removing material under irradiation with near IR rays of 400 to 200nm wavelength. The performance is further improved by using alkoxide of metals, such as titanium and aluminum, in combination with the reactive photoconductors. The peeling of the semiconductors, pulp, etc., from the granular pulp is prevented if a binder, such as latex, is used in combination at the time of producing the granular pulp.
申请公布号 JPH04256755(A) 申请公布日期 1992.09.11
申请号 JP19910037885 申请日期 1991.02.08
申请人 NIPPON ZEON CO LTD 发明人 SEKIGUCHI KENICHI;UEDA TSUNEHISA;NATSUUME YOSHIO
分类号 A61L9/16;A61L9/01;A61L9/20;B01D53/86 主分类号 A61L9/16
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