发明名称 |
RADIATION-SENSITIVE COMPOSITION |
摘要 |
PURPOSE:To obtain a radiation-sensitive compsn. not swellable with a developing soln., having high resolution and suitable for use as a resist compsn. fit for irradiation with various radial rays. CONSTITUTION:This radiation-sensitive compsn. contains a phenolic polymer contg. partially allylated hydroxyl groups and a radiation-sensitive acid forming agent. The number of allyloxy groups contained in the phenolic polymer is 0.1-2.0, preferably 0.3-1.2 times as large as the number of phenolic hydroxyl groups usually contained in the polymer. The phenolic polymer contains 5-37wt.%, preferably 10-30wt.% hydroxyl and allyloxy groups. |
申请公布号 |
JPH04246651(A) |
申请公布日期 |
1992.09.02 |
申请号 |
JP19910031785 |
申请日期 |
1991.01.31 |
申请人 |
JAPAN SYNTHETIC RUBBER CO LTD |
发明人 |
MURATA MAKOTO;KOBAYASHI HIDEKAZU;ISAMOTO YOSHITSUGU;MIURA TAKAO |
分类号 |
G03F7/004;G03F7/022;G03F7/029;G03F7/038;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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