发明名称 Multilayer wiring structure and method for forming multilayer construction.
摘要 <p>Low-thermal-expansivity polyimides have a linear rigid skeleton, so that adhesion between perfectly cured low-thermal-expansivity polyimide films is very low. On the other hand, a film of a polyimide (2, 4, 6) having a flexible skeleton shows high adhesiveness even after perfect curing, so that it is possible to enhance adhesion between the low-thermal-expansivity polyimide films (3, 7) by interposing a polyimide having a flexible skeleton. A flexible polyimide thin film (2, 4, 6) is formed as a highly adhesive film on a low-thermal-expansivity polyimide film (3, 7) n a half-cured state, then metallic wiring (5) is applied thereon, followed by formation of another highly adhesive thin film (2, 4, 6) in a half-cured state, and then a low-thermal-expansivity polyimide film (3, 7) is further formed thereon. It is possible to provide a multilayer wiring structure which has improved adhesion between the low-thermal-expansivity polyimide film (3, 7) and the wiring pattern layer (5) or the substrate. <IMAGE></p>
申请公布号 EP0499986(A2) 申请公布日期 1992.08.26
申请号 EP19920102530 申请日期 1992.02.14
申请人 HITACHI, LTD. 发明人 TAWATA, RIE;NUMATA, SHUNICHI;MIWA, TAKAO;FUJISAKI, KOJI;IKEDA, TAKAYOSHI;OKABE, YOSHIAKI;SHIMANOKI, HISAE
分类号 C08G73/10;H01L23/498;H05K1/00;H05K1/03;H05K3/46;(IPC1-7):H05K1/03 主分类号 C08G73/10
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