发明名称 |
DEPOSITION OF THALLIUM OXIDE FOR CONTROLLED THALLIUM SUPERCONDUCTOR FILM, AND CONSTITUTION OF REACTOR |
摘要 |
<p>PURPOSE: To manufacture a thallium and copper oxide-based high-temperature superconducting film on various substrates by providing a container having a large cavity for containing a substrate and a film, and providing this container with an opening part through which thallium can pass. CONSTITUTION: The container having a cavity 20 which is sufficiently large to contain a substrate and film is provided as the container of a reactor 10. The container has an opening part through which thallium can pass. For example, the reactor 10 is equipped with a top plate 12 and a base plate 14 which function as a susceptor. These plates 12 and 14 function as reproducible reactive substances, which are effective for controlling of the deposition temperature in a heat treatment and give a temperature gradient between a coating film 22 and a deposited film 16 which face it. Further, the cavity 20 is surrounded with a cap plate 22 and a spacer foil. Consequently, the thallium and copper oxide-based high-temperature superconducting film can be manufactured on various substrates.</p> |
申请公布号 |
JPH04229669(A) |
申请公布日期 |
1992.08.19 |
申请号 |
JP19910097617 |
申请日期 |
1991.04.26 |
申请人 |
SUUPAAKONDAKUTAA TEKUNOROJIIZU INC |
发明人 |
MAIKERU MAATEIN EDEII;UIRIAMU REBIN ORUSON;TEIMOSHII UORUTON JIEIMUZU |
分类号 |
C01G1/00;C01G15/00;C23C14/08;C23C14/34;C23C14/54;C23C14/58;C30B11/00;C30B23/02;C30B33/00;F27B17/00;H01L39/14;H01L39/24;H01P1/203 |
主分类号 |
C01G1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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