| 发明名称 |
TREATMENT OF SILICON WAFERS IN ORDER TO ACHIEVE CONTROLLED PRECIPITATION PROFILES THEREIN ADAPTED FOR MANUFACTURING ELECTRONIC COMPONENTS |
| 摘要 |
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| 申请公布号 |
IL99979(D0) |
申请公布日期 |
1992.08.18 |
| 申请号 |
IL19910099979 |
申请日期 |
1991.11.07 |
| 申请人 |
MEMC ELECTRONIC MATERIALS S.P.A. |
发明人 |
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| 分类号 |
C30B33/02;H01L21/02;H01L21/26;H01L21/322;H01L21/324;(IPC1-7):H01L/ |
主分类号 |
C30B33/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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