PHOTOMASK BLANK AND PHOTOMASK

摘要

PURPOSE:To produce a photomask by using a photomask blank having superior dry etchability and capable of forming a fine pattern having high accuracy. CONSTITUTION:A light shielding thin film 2 based on boron is formed on a transparent substrate 1 and a light reflection reducing layer 3 is formed on the top of the film 2 or a light reflection reducing layer 4 is further formed on the bottom of the film 2. The light shielding thin film 2 and the light reflection reducing layers of the resulting photomask blank are patterned.