| 摘要 |
PURPOSE:To provide a pattern inspection device with which the defect at the pattern angular part which does not substantially give influence even if the pattern inspection precision (sensitivity) is increased is not detected as the pseudo defect. CONSTITUTION:A pattern inspection device for inspecting the pattern formed by the photographic erosion method is constituted of a scan means which optically scans the pattern and outputs a scan signal, memory device (23) which stores the design information for the pattern, correcting means (25) which outputs the pattern signal of the pattern whose angular part is defective on the basis of the design information read out from the memory device, and a comparison means (27) which detects the defect of the pattern by the comparison with the scan signal, having the pattern signal as standard. |
