| 摘要 |
<p>PURPOSE:To enable transfer to a final substrate without defects due to bubbles, etc., and to also enable satisfactory exfoliation from a tentative substrate and exposure in the air by forming a separation layer which adheres more tightly to a photosensitive resin layer than to the tentative substrate, has low oxygen permeability and softens at a specified temp. CONSTITUTION:A separation layer is formed on a tentative substrate by applying and drying a soln. of the material of the layer and a photosensitive resin layer is formed on the separation layer by applying and drying a soln. of the resin in a solvent which does not dissolve the separation layer to produce a transfer material used. The photosensitive resin layer is stuck to a final substrate under heating while applying pressure as required, the tentative substrate is stripped off and exposure through a prescribed mask and development are carried out. An org. polymer having about <=80 deg.C softening point is used as the material of the separation layer because the transfer material can be transferred to a rugged substrate optionally under pressure without leaving bubbles when the polymer having a low softening point is used.</p> |
