PROCESS FOR ETCHING WITH GASEOUS PLASMA,申请号EP19880905176-传众专利搜索

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发明名称	PROCESS FOR ETCHING WITH GASEOUS PLASMA
摘要
申请公布号	EP0359777(B1)	申请公布日期	1992.07.29
申请号	EP19880905176	申请日期	1988.05.31
申请人	COMMISSARIAT A L'ENERGIE ATOMIQUE ETABLISSEMENT DE CARACTERE SCIENTIFIQUE TECHNIQUE ET INDUSTRIEL	发明人	CHARLET, BARBARA;PECCOUD, LOUISE
分类号	C23C16/50;C23C16/517;C23F4/00;G11B5/31;H01J37/32;H01L21/302;H01L21/3065;H05H1/46	主分类号	C23C16/50
代理机构		代理人
主权项
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