| 摘要 |
PURPOSE:To obtain a polystyrenic resin composition having excellent permanent antistatic performances without damaging physical properties of resin of its own by blending a polystyrenic resin with a specific copolymer containing sulfonic group. CONSTITUTION:A polystyrenic resin composition comprising (A) 100 pts.wt. polystyrenic resin (e.g. impact-resistant polystyrene or ABS resin), (B) 0.1-30 pts.wt. copolymer having 5,000-500,000 molecular weight prepared by copolymerizing B1: 1-50wt.% sulfonic group-containing monomer (e.g. 2-sulfoethyl methacrylate or styrenesulfonic acid) with B2: 20-99wt.% styrenic monomer (e.g. alpha-methylstyrene or vinyltoluene) and B3: 0-70wt.% another copolymerizable monomer (e.g. acrylonitrile or maleic anhydride) and optionally various kinds of additives. |
