发明名称 RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING USING SAME
摘要 PURPOSE:To improve transmittance to a short wavelength ultraviolet ray, make an irradiated region insoluble to an alkali developer, and moreover stabilize a composition by containing a specific organic compound in the composition. CONSTITUTION:A composition contains an alikali soluble macromolecule (preferably phenol resin), an organic compound (A) having a carboxyl group and a hydroxyl group bonded to secondary or tertiary carbon in the same molecule, and an acid precursor (e.g. triaryl sulfonium salt) generating acid by radiation irradiation. The heating of the compound A (e.g. benzilic acid) under the existence of strong acid effectively causes an esterification reaction to generate a water repellent compound. Consequently the esterification reaction is caused due to acid from the acid precursor in an irradiation region when heating is made after the radiation irradiation, and the irradiated region becomes insoluble to an alkali developer.
申请公布号 JPH04186247(A) 申请公布日期 1992.07.03
申请号 JP19900313940 申请日期 1990.11.21
申请人 HITACHI LTD;HITACHI CHEM CO LTD 发明人 UCHINO MASAICHI;TADANO KEIKO
分类号 G03F7/004;C08L61/04;C08L61/06;G03F7/038;H01B5/14;H01L21/027 主分类号 G03F7/004
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