发明名称 |
APPARATUS AND METHOD OF CATHODIC ARC DEPOSITION |
摘要 |
Cathodic arc deposition method and apparatus, including an arc evaporation source containing a film forming material. A substrate is arranged on the central axis line of and in front of the evaporation surface of the arc evaporation source. At least one magnet coil is arranged around the central axis line and between the arc evaporation source and the substrate.
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申请公布号 |
US5126030(A) |
申请公布日期 |
1992.06.30 |
申请号 |
US19900625013 |
申请日期 |
1990.12.10 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO |
发明人 |
TAMAGAKI, HIROSHI;AKARI, KOICHIRO |
分类号 |
C23C14/32;H01J37/32;H05K3/28 |
主分类号 |
C23C14/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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