VACUUM TREATMENT DEVICE

摘要

PURPOSE:To avoid a non-uniformity of the substrate processing speed due to a difference in location of processed substrates in a processing container by equipping the titled device with a straightening vane driving section which changes a condition of a straightening vane against the flow of material gas supplied through a gas lead-in section. CONSTITUTION:Each silicon substrate 24 is placed between receiver plates of a boat 23. A straightening vane 30a is so located between a gas lead-in port 25 and the boat 23 that it may rotate like a blade of a fan against a side wall part of a processing container 22. A supporting shaft of the straightening vane 30a is connected to a rotational output shaft of a straightening vane driving section 30b, which works while the silicon substrates 24 are processed and gives the straightening vane 30a both positive and reverse rotations. Consequently, the distribution of flow velocity of material gas supplied through the gas lead-in section 25 during a vacuum process of the silicon substrates 24 can be controlled timewise and a non-uniformity of the processing speed of the substrates due to a difference in location of the processed substrates 24 in the processing container 22 can also be avoided.