| 摘要 |
Aqueous H2O2 solutions are freed of organic impurities which are adsorbed on to activated charcoal powder, granules, lumps or scales which has been previously washed with acid and partially deactivated by impregnation with 20 to 40% by weight of organic solvent, such as CCl4, heptane, hexane, trichloroethylene or perchloroethylene, that is inert to H2O2 and immiscible with water. Traces of this solvent left in the purified H2O2 may be removed by bubbling air, or nitrogen through the H2O2. The process may be continuous with the liquid circuit passing through at least two adsorption columns in series packed with the carbon. |
