Grafted-crystal-film integrated optics and optoelectronic devices

摘要

Integrated devices, comprising an optical waveguide in a substrate, are made by attaching a crystal film to the substrate. Such films can be made by an epitaxial lift-off technique which involves epitaxial growth on an auxiliary substrate, release of a grown single- or multi-layer film from the auxiliary substrate, and transfer of the released film to its intended location where lithographic patterning can be used for the production of devices accurately positioned relative to waveguides. Electrical contacts to devices can take the form of metallic layers which further can serve to secure film edges to the substrate.