Positive type photosensitive anionic electrodeposition coating resin composition.

摘要

A resin composition comprising (A) a copolymer obtained by copolymerising (a) acrylic acid and/or methacrylic acid, (b) at least one compound bearing a group unsatable to acid such as t-amyl acrylate or t-amyl methacrylate and (c) a copolymerizable monomer such as n-butyl acrylate and (B) a photoacid generator is effective for providing electrodeposition baths with good water dispersion stability and may be used to produce electrodeposited films having high sensitivity and high resolution.