| 摘要 |
PURPOSE:To find only the sticking of dust which causes a problem at the time of exposure by arranging two microscopes and finding differences in shape and size between two circuit pattern picked-up image obtained by those microscopes. CONSTITUTION:A driving part 3 moves a photomask 2 and one of the microscopes 1 with image pickup functions is positioned in the circuit pattern area on one end side of the photomask 2. Then respective circuit pattern areas are picked up by the microscopes 1 with the image pickup functions and an image processing part 4 outputs image data corresponding to respective circuit patterns; and a data comparison part 5 compares the two sent image data and sends the comparison result to a monitor 6, and whether there is a difference or not is displayed on the display. Then the photomask 2 is moved to place a next circuit pattern below the microscope with the image pickup function and similar inspection is performed; if there is a difference found halfway between two circuit patterns, it is judged that dust sticks and a defective is decided. Consequently, dust which is not problem in photoresist exposure is detected. |
