| 摘要 |
PURPOSE:To eliminate pattern errors in time of forming minute patterns and to diminish stress-strain in the direction of a mask board surface, by providing an intermediate layer for absorbing stresses produced between the mask board and an X-ray absorber in time of forming an absorber pattern. CONSTITUTION:An intermediate layer 8 is made of tungsten sulfide being a laminar compound having a crystal layer in the horizontal direction to a mask board 1 between the board and an absorber film. This can ease shrinkage stresses produced in time of forming an absorber pattern 2 by patterning the absorber film, by the rearrangement of forces working between the layers. As a result, the absorber pattern 2 does not exfoliate, and X-ray exposing masks without the size errors of patterns can be obtained. |
