发明名称 PROCESS FOR PREPARING SILICON DIOXIDE COATING
摘要 <p>A process for preparing a silicon dioxide coating which comprises bringing a treating solution comprising a hydrosilicofluoric acid wherein silicon dioxide is in a supersaturated state into contact with a substrate, such as glass, to precipitate a silicon dioxide coating on the surface of the substrate, characterized in that a means for preventing the separation of the silicon component from the treating solution is provided. This process brings about neither a deterioration of the working atmosphere nor a lowering in the concentration of the solution.</p>
申请公布号 WO1992007793(P1) 申请公布日期 1992.05.14
申请号 JP1990001380 申请日期 1990.10.25
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